Atommagkutató Intézet
MTA Kiváló Kutatóhely

Ionimplantáció

Kompetencia terület Plasma and ion-beam technologies
Módszer ECRIS
Kapcsolattartó
Szakmai leírás

Low energy multiply charged ions (e. g.  Si, Ca, Au, Ag) are possible to be generated by Electron Cyclotron Resonance Ion Source (ECRIS) in order to modify the material’s surfaces (e.g. Titanium, Zirconia)  on nanoscale, to obtain functional surfaces of implants and restorations. Irradiation chamber is developed to implant the ions in a controlled and effective way.

 

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